17th Annual Symposium on Photomask Technology and Management
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17th Annual Symposium on Photomask Technology and Management [proceedings] : 17-19 September, 1997, Redwood City, California by Symposium on Photomask Technology and Management (17th 1997 Redwood City, California)

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Published by SPIE in Bellingham, Washington .
Written in English

Subjects:

  • Integrated circuits -- Masks -- Congresses.,
  • Microlithography -- Congresses.

Book details:

Edition Notes

Includes bibliographical references and index.

StatementJames A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
SeriesSPIE proceedings series ;, v. 3236, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3236.
ContributionsReynolds, James A., 1930-, Grenon, Brian J., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers.
Classifications
LC ClassificationsTK7874 .S9435 1997
The Physical Object
Paginationix, 554 p. :
Number of Pages554
ID Numbers
Open LibraryOL464685M
ISBN 100819426695
LC Control Number98184513
OCLC/WorldCa38828787

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